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Abstract #5442

Quasi MR-imaging Artefact Free ECoG and Intracortical Electrodes

Johannes B. Erhardt1, Maria Vomero1,2, Jochen Leupold3, Calogero Gueli1,2, Sam Kassegne2, and Thomas Stieglitz1

1Dep. of Microsystems Engineering, University of Freiburg, Freiburg, Germany, 2Dep. of Mechanical Engieneering, San Diego State University, United States, 3Dep. of Radiology, University Medical Center Freiburg, Germany

The combination of implantable neural electrodes and fMRI holds great potential for better understanding the human brain. However, the image acquisition - especially in the vicinity of the implants - is compromised by artifacts caused by metal components. In this work we address this issue by studying different types of devices in terms of designs and materials, and by quantifying their MRI artifacts. Doing so we demonstrate the quasi artifact-free behavior of a hybrid probe combining surface and penetrating carbon electrodes into a single sheet of polyimide, after comparing it with conventional implants in high field MRI and clinical fMRI.

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