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Abstract #4169

RF heating asymmetry in the implants placed at opposite lateral halves of the ASTM phantom

Bhumi Bhusal1, Tanvir Baig1, Pallab Bhattacharyya2, Stephen Jones2, and Michael Martens1

1Case Western Reserve University, Cleveland, OH, United States, 2Cleveland Clinic, Cleveland, OH, United States

The rectangular shape of ASTM phantom may result into asymmetry in heating when an implant is placed symmetrically on the left and right lateral half of the phantom. In this work, we study the RF induced heating at the tip of a long insulated implant partially immersed into the crown of an ASTM phantom through two opposite lateral halves. The position of the wire on the left and right halves are symmetrical about the central sagittal plane. The results show that the RF heating of an implant is 2-3 times higher at left than at right half of phantom.

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