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Abstract #2846

Is low field always better for imaging around passive implants?

Robert Weaver1, Chris Bowen2,3,4, James Rioux2,3,4, Sharon Clarke2,4,5, Elena Adela Cora4,5, David Volders4,5, Kimberly Brewer1,2,3,4, and Steven Beyea1,2,3,4
1Biomedical Engineering, Dalhousie University, Halifax, NS, Canada, 2Biomedical Translational Imaging Centre (BIOTIC), QEII Health Sciences Center, Halifax, NS, Canada, 3Physics and Atmospheric Science, Dalhousie University, Halifax, NS, Canada, 4Diagnostic Radiology, Dalhousie University, Halifax, NS, Canada, 5Diagnostic Imaging, Nova Scotia Health, Halifax, NS, Canada

Synopsis

Keywords: Low-Field MRI, Susceptibility, Routine Protocols

Motivation: To investigate the performance of modernized low-field MRI relative to traditional systems for imaging near metallic devices within the clinical context.

Goal(s): To evaluate whether low-field MRI can offer a significant reduction in artifacts when using routine clinical protocols.

Approach: The artifact characteristics of 0.5 T, 1.5 T, and 3 T MRIs are compared in this ASTM F2119-07-based phantom study of common passive metallic devices.

Results: Low-field MRI demonstrated the capability to reduce susceptibility artifacts when imaging near metal-containing medical devices. However, artifact produced by some pulse sequences diverged from the anticipated field-dependence, highlighting the sizable effects of clinical protocolling.

Impact: This phantom study demonstrates that low-field MRI can image metallic devices with reduced artifact relative to 1.5/3 T systems using routine clinical protocols, highlighting opportunities for future in vivo studies involving implants and imaging in areas with magnetic susceptibility distortions.

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